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清华大学材料科学与工程研究院《材料科学论坛》学术报告:Next-Generation Oxide Thin Films for Radio Frequency Acoustic Resonators

清华大学材料科学与工程研究院《材料科学论坛》学术报告

报告时间:20251013日下午15:30-17:00

报告人:Huajun Liu

报告地点:清华大学逸夫技术科学楼A205学术报告厅

邀请人:李千老师

报告题目:Next-Generation Oxide Thin Films for Radio Frequency Acoustic Resonators


报告简介:

High speed and low latency 5G/6G wireless communications are critical for emerging technologies such as autonomous vehicles, internet of things and virtual reality. However, the current speed limitation of radio frequency front end chips in mobile devices mainly comes from the bandwidth of acoustic filters. Developing next generation of piezoelectric thin films with high electro-mechanical coupling coefficients is therefore the key enabler for high speed wireless networks. In this talk, I will share our recent research work on sodium niobate thin films with ultrahigh piezoelectric coefficients (Science, 369, 292, 2020; Nature, 633, 798, 2024). I will also discuss about their device applications in radio frequency acoustic resonators.


报告人简介:

Dr. Huajun Liu is currently the deputy head, Sensors & Flexible Electronics department, group leader of The Oxide Lab at IMRE, A*STAR and Adjunct Associate Professor at Nanyang Technological University, Singapore. His team focuses on developing high performance oxide thin films for next generation microelectronics in 5G/6G wireless communications and electro-optical modulators. He has published first author/corresponding author papers in top research journals, including Science and Nature. He received the Charles Hatchett Award from Institute of Materials, Minerals and Mining, UK and 2024 A*STAR Fellow. As the principal investigator, he has been awarded multiple research programs from National Research Foundation and A*STAR, Singapore.

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